Date: Thursday, Jun 7th
Presenter: Dr. Joe Nabity, JC Nabity Lithography Systems
Electron microscopes have been used for e-beam lithography for decades and are still often the best choice for the lithography needed in many research applications. The seminar will provide an introduction to e-beam lithography and the use of commercial electron microscopes for lithography. The second part of the seminar will provide an overview of the Nanometer Pattern Generation System (NPGS) which is widely used for SEM lithography and also for ion beam lithography.
Joe Nabity attended Montana State University as an undergraduate (BS, Physics, 1984), before working for two years at Bell Labs in Murray Hill, NJ. Through the in-house program at Bell Labs, he received a Masters degree from Stevens Institute of Technology (MS, Materials Science, 1986). His graduate work at the University of Oregon was in the area of condensed matter physics (PhD, Physics, 1991). In the course of completing his thesis on phonons in low dimensional devices, he developed an SEM based lithography system which became the Nanometer Pattern Generation System (NPGS). While a graduate student at UO, he began selling NPGS which became a full time business for the past 20 years. NPGS is now used in almost 400 research labs around the world.